CD-SEM technique for wafers fabrication control

US9824852B2 · kind B2 · utility

Assignee

• Applied Materials Israel Ltd. · IL

Inventors

• Roman Kris · Jerusalem, IL
• Yakov Weinberg · Beit She'an, IL
• Yan Ivanchenko · Nes Ziona, IL
• Ishai Schwarzband · Or Yehuda, IL
• Dan Lange · Haifa, IL
• Arbel Englander · Nes Ziona, IL
• Efrat Noifeld · Rehovot, IL
• Ran Goldman · Hod HaSharon, IL
• Ori Shoval · Ashdod, IL

Key dates

• Filing date: Dec 31, 2015
• Grant date: Nov 21, 2017
• Expiry date: Dec 31, 2035

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01J2237/2817
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A Critical Dimensions Scanning Electron Microscope (CD-SEM) is described that comprises a unit for performing CD-SEM measurements of a semiconductor wafer, a BSE imaging unit for obtaining a Grey Level image (GL) of the wafer, and a unit for GL analysis and for processing the GL analysis results with reference to results of the CD-measurements.