Patent · US Active

Apparatus and process for producing a single crystal of silicon

US9828692B2 · kind B2 · utility

0Cited by
0References
12Claims
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Assignee

Inventors

Key dates

Filing dateMar 27, 2015
Grant dateNov 28, 2017
Priority date
Expiry dateAug 6, 2035

Classification

  • Technology area (CPC C)Chemistry; Metallurgy
  • CPC primaryC30B29/06
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

An apparatus for producing a single crystal of silicon comprises a plate with a top side, an outer edge, and an inner edge, a central opening adjoining the inner edge, and a tube extending from the central opening to beneath the bottom side of the plate;

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.