Apparatus and process for producing a single crystal of silicon
US9828692B2 · kind B2 · utility
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12Claims
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Key dates
| Filing date | Mar 27, 2015 |
| Grant date | Nov 28, 2017 |
| Priority date | — |
| Expiry date | Aug 6, 2035 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC30B29/06
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
An apparatus for producing a single crystal of silicon comprises a plate with a top side, an outer edge, and an inner edge, a central opening adjoining the inner edge, and a tube extending from the central opening to beneath the bottom side of the plate;
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.