Patent · US Active

System correction from long timescales

US9829800B2 · kind B2 · utility

0Cited by

1References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Boris Bittner · Roth, DE
Norbert Wabra · Werneck, DE
Martin von Hodenberg · Oberkochen, DE
Sonja Schneider · Lehrberg, DE
Ricarda Schoemer · Zusmarshausen, DE
Ruediger Mack · Langenau, DE

Key dates

Filing date	Dec 17, 2014
Grant date	Nov 28, 2017
Priority date	—
Expiry date	Apr 1, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70891
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Aberrations of a projection lens for microlithography can be subdivided into two classes: a first class of aberrations, which are distinguished by virtue of the fact that their future size increases by a non-negligible value after a constant time duration, independently of their current size, and a second class of aberrations, which, after reaching a threshold, only increase by a negligible value after each further time duration. An adjustment method is proposed, which adjusts these two classes of aberrations in parallel in time with one another.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.