Method for adjusting effective work function of metal gate
US9831089B2 · kind B2 · utility
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9Claims
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Key dates
| Filing date | Aug 30, 2013 |
| Grant date | Nov 28, 2017 |
| Priority date | — |
| Expiry date | Nov 10, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH10D64/017
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A method for adjusting an effective work function of a metal gate. The method includes forming a metal gate arrangement comprising at least a metal work function layer, and performing plasma treatment on at least one layer in the metal gate arrangement. In this way, it is possible to adjust the effective work function of the metal gate in a relatively flexible way.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.