Optical heat source with restricted wavelengths for process heating
US9842752B2 · kind B2 · utility
1Cited by
4References
12Claims
0Family size
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Key dates
| Filing date | Jun 21, 2013 |
| Grant date | Dec 12, 2017 |
| Priority date | — |
| Expiry date | Jul 19, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01J2237/2001
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A semiconductor manufacturing system or process, such as an ion implantation system, apparatus and method, including a component or step for heating a semiconductor workpiece are provided. An optical heat source emits light energy to heat the workpiece. The optical heat source is configured to provide minimal or reduced emission of non-visible wavelengths of light energy and emit light energy at a wavelength in a maximum energy light absorption range of the workpiece.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.