Upper dome with injection assembly

US9845550B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Paul Brillhart · Pleasanton, US
• Anzhong Chang · San Jose, US
• Edric Tong · Sunnyvale, US
• Kin Pong Lo · Fremont, US
• James Francis Mack · Palo Alto, US
• Zhiyuan Ye · San Jose, US
• Kartik Shah · Saratoga, US
• Errol Antonio C. Sanchez · Tracy, US
• David K. Carlson · San Jose, US
• Satheesh Kuppurao · San Jose, US
• Joseph M. Ranish · San Jose, US

Key dates

• Filing date: Feb 3, 2015
• Grant date: Dec 19, 2017
• Expiry date: Jan 24, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67115
• WIPO field: Surface technology, coating
• WIPO sector: Chemistry

Abstract

Embodiments provided herein generally relate to an apparatus for delivering gas to a semiconductor processing chamber. An upper quartz dome of an epitaxial semiconductor processing chamber has a plurality of holes formed therein and precursor gases are provided into a processing volume of the chamber through the holes of the upper dome. Gas delivery tubes extend from the holes in the dome to a flange plate where the tubes are coupled to gas delivery lines. The gas delivery apparatus enables gases to be delivered to the processing volume above a substrate through the quartz upper dome.