Small-angle scattering X-ray metrology systems and methods
US9846132B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Oct 15, 2014 |
| Grant date | Dec 19, 2017 |
| Priority date | — |
| Expiry date | Jun 28, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N33/0095
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
Disclosed are apparatus and methods for performing small angle x-ray scattering metrology. This system includes an x-ray source for generating x-rays and illumination optics for collecting and reflecting or refracting a portion of the generated x-rays towards a particular focus point on a semiconductor sample in the form of a plurality of incident beams at a plurality of different angles of incidence (AOIs). The system further includes a sensor for collecting output x-ray beams that are scattered from the sample in response to the incident beams on the sample at the different AOIs and a controller configured for controlling operation of the x-ray source and illumination optics and receiving the output x-rays beams and generating an image from such output x-rays.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.