Decreasing inaccuracy due to non-periodic effects on scatterometric signals
US9851300B1 · kind B1 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 3, 2015 |
| Grant date | Dec 26, 2017 |
| Priority date | — |
| Expiry date | Apr 3, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70633
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
Methods and metrology modules and tools are provided, which minimize an estimated overlay variation measure at misalignment vector values obtained from a derived functional form of an overlay linear response to non-periodic effects. Provided methods further quantifying target noise due to the non-periodic effects using multiple repeated overlay measurements of the target cells, calculating an ensemble of overlay measurements between the cells over the multiple measurement repeats and expressing the target noise as a statistical derivative of the calculated overlay measurements. Sub-ensembles may be selected to further characterize the target noise. Various outputs include optimized scanning patterns, target noise metrics and recipe and target optimization.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.