Patent · US Active

Wetting pretreatment for enhanced damascene metal filling

US9852913B2 · kind B2 · utility

2Cited by
70References
11Claims
0Family size

Assignee

Inventors

Key dates

Filing dateJan 9, 2015
Grant dateDec 26, 2017
Priority date
Expiry dateJan 9, 2036

Classification

  • Technology area (CPC H)Electricity
  • CPC primaryH01L21/76898
  • WIPO fieldSurface technology, coating
  • WIPO sectorChemistry

Abstract

Disclosed are pre-wetting apparatus designs and methods. These apparatus designs and methods are used to pre-wet a wafer prior to plating a metal on the surface of the wafer. Disclosed compositions of the pre-wetting fluid prevent corrosion of a seed layer on the wafer and also improve the filling rates of features on the wafer.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.