Rotatable heated electrostatic chuck

US9853579B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Anantha K. Subramani · San Jose, US
• Ashish Goel · Stanford, US
• Wei Wang · Santa Clara, US
• Bharath Swaminathan · San Jose, US
• Vijay D. Parkhe · San Jose, US
• Xiaoxiong Yuan · Cupertino, US

Key dates

• Filing date: Dec 4, 2014
• Grant date: Dec 26, 2017
• Expiry date: Jul 30, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/68792
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

An electrostatic chuck includes a dielectric disk having a support surface to support a substrate and an opposing second surface, wherein at least one chucking electrode is disposed within the dielectric disk; a radio frequency (RF) bias plate disposed below the dielectric disk; a plurality of lamps disposed below the RF bias plate to heat the dielectric disk; a metallic plate disposed below the lamps to absorb heat generated by the lamps; a shaft coupled to the second surface of the dielectric disk at a first end of the shaft to support the dielectric disk in a spaced apart relation to the RF bias plate and extending away from the dielectric disk and through the RF bias plate and the metallic plate; and a rotation assembly coupled to the shaft to rotate the shaft and the dielectric disk with respect to the RF bias plate, lamps, and metallic plate.