Off-angled heating of the underside of a substrate using a lamp assembly

US9863038B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Maurice E. Ewert · San Jose, US
• Anantha K. Subramani · San Jose, US
• Umesh M. Kelkar · Santa Clara, US
• Chandrasekhar Balasubramanyam · Bengaluru, IN
• Joseph M. Ranish · San Jose, US

Key dates

• Filing date: Mar 14, 2013
• Grant date: Jan 9, 2018
• Expiry date: Feb 18, 2036

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/76882
• WIPO field: Semiconductors
• WIPO sector: Electrical engineering

Abstract

Disclosed are method and apparatus for treating a substrate. The apparatus is a dual-function process chamber that may perform both a material process and a thermal process on a substrate. The chamber has an annular radiant source disposed between a processing location and a transportation location of the chamber. Lift pins have length sufficient to maintain the substrate at the processing location while the substrate support is lowered below the radiant source plane to afford radiant heating of the substrate. A method of processing a substrate having apertures formed in a first surface thereof includes depositing material on the first surface in the apertures and reflowing the material by heating a second surface of the substrate opposite the first surface. A second material can then be deposited, filling the apertures partly or completely. Alternately, a cyclical deposition/reflow process may be performed.