Measuring device having ideal wavefront generator for detecting point diffraction interferometric wavefront aberration of measured optical system and method for detecting wavefront aberration thereof

US9863841B2 · kind B2 · utility

Assignee

• Shanghai Institute of Optics And Fine Mechanics, Chinese Academy of Sciences · CN

Inventors

• Xiangzhao Wang · Shanghai, CN
• Feng Tang · Geneva, US
• Guoxian Zhang · Fremont, US
• Shifu Xu · Shanghai, CN

Key dates

• Filing date: Dec 31, 2015
• Grant date: Jan 9, 2018
• Expiry date: Apr 10, 2036

Classification

• Technology area (CPC G): Physics
• CPC primary: G01J2009/0265
• WIPO field: Measurement
• WIPO sector: Instruments

Abstract

A point diffraction interferometric wavefront aberration measuring device comprising an optical source, an optical splitter, a first light intensity and polarization regulator, a phase shifter, a second light intensity and polarization regulator, an ideal wavefront generator, an object precision adjusting stage, a measured optical system, an image wavefront detection unit, an image precision adjusting stage, and a data processing unit. The center distance between the first output port and the second output port of the ideal wavefront generator is smaller than the diameter of the isoplanatic region of the measured optical system and is greater than the ratio of the diameter of the image point dispersion speckle of the measured optical system over the amplification factor thereof. A method for detecting wavefront aberration of the optical system is also provided by using the device.