Patent · US Active

Apparatus and methods for photomask backside cleaning

US9864283B2 · kind B2 · utility

0Cited by

7References

17Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Jason Rye · Kalispell, US
Kyle M. Hanson · Kalispell, US

Key dates

Filing date	Nov 18, 2015
Grant date	Jan 9, 2018
Priority date	—
Expiry date	Nov 18, 2035

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/68728
WIPO fieldOptics
WIPO sectorInstruments

Abstract

Apparatus for cleaning a photo mask includes a rotor in a head, with the rotor having a seal plate having a central opening, a resilient mask seal in the central opening, and retractors attached to the resilient mask seal and adapted to move the resilient mask seal into open and closed positions. A motor in the head rotates the rotor. A push plate in the head moves to operate the retractors. In the closed position the resilient mask seal seals against the sides of the photo mask. The back side of the photo mask can then be cleaned without affecting the patterned front side of the photo mask.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.