Kyle M. Hanson
114Patents
24h-index
91Co-inventors
93Inventor score
Filing activity: Sep 18, 1997 → Jan 24, 2023
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US6080291A | Apparatus for electrochemically processing a workpiece including an electrical contact assembly having a seal member | Chemistry; Metallurgy | 229 | Expired |
| US6497801B1 | Electroplating apparatus with segmented anode array | Chemistry; Metallurgy | 86 | Expired |
| US5985126A | Semiconductor plating system workpiece support having workpiece engaging electrodes with distal contact part and dielectric cover | Electricity | 84 | Expired |
| US6004440A | Cathode current control system for a wafer electroplating apparatus | Emerging Cross-Sectional Technologies | 83 | Expired |
| US6254742A | Diffuser with spiral opening pattern for an electroplating reactor vessel | Emerging Cross-Sectional Technologies | 81 | Expired |
| US6091498A | Semiconductor processing apparatus having lift and tilt mechanism | Electricity | 75 | Expired |
| US6270647A | Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operations | Chemistry; Metallurgy | 75 | Expired |
| US6309524A | Methods and apparatus for processing the surface of a microelectronic workpiece | Chemistry; Metallurgy | 64 | Expired |
| US6368475B1 | Apparatus for electrochemically processing a microelectronic workpiece | Electricity | 63 | Expired |
| US6309520A | Methods and apparatus for processing the surface of a microelectronic workpiece | Chemistry; Metallurgy | 61 | Expired |
| US6228232A | Reactor vessel having improved cup anode and conductor assembly | Chemistry; Metallurgy | 61 | Expired |
| US6672820B1 | Semiconductor processing apparatus having linear conveyer system | Chemistry; Metallurgy | 58 | Expired |
| US6303010A | Methods and apparatus for processing the surface of a microelectronic workpiece | Chemistry; Metallurgy | 55 | Expired |
| US6004828A | Semiconductor processing workpiece support with sensory subsystem for detection of wafers or other semiconductor workpieces | Electricity | 47 | Expired |
| US6645355B2 | Semiconductor processing apparatus having lift and tilt mechanism | Electricity | 44 | Expired |
| US6139703A | Cathode current control system for a wafer electroplating apparatus | Emerging Cross-Sectional Technologies | 43 | Expired |
| US6660137B2 | System for electrochemically processing a workpiece | Emerging Cross-Sectional Technologies | 43 | Expired |
| US7002698B2 | Semiconductor processing apparatus having lift and tilt mechanism | Electricity | 41 | Expired |
| US6921468B2 | Electroplating system having auxiliary electrode exterior to main reactor chamber for contact cleaning operations | Chemistry; Metallurgy | 35 | Expired |
| US6547937B1 | Microelectronic workpiece processing tool including a processing reactor having a paddle assembly for agitation of a processing fluid proximate to the workpiece | Chemistry; Metallurgy | 30 | Expired |
| US6428662B1 | Reactor vessel having improved cup, anode and conductor assembly | Chemistry; Metallurgy | 29 | Expired |
| US6280582A | Reactor vessel having improved cup, anode and conductor assembly | Chemistry; Metallurgy | 27 | Expired |
| US6654122B1 | Semiconductor processing apparatus having lift and tilt mechanism | Electricity | 24 | Expired |
| US6280583A | Reactor assembly and method of assembly | Chemistry; Metallurgy | 24 | Expired |
| US6569297B2 | Workpiece processor having processing chamber with improved processing fluid flow | Emerging Cross-Sectional Technologies | 23 | Expired |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.