Ion assisted deposition for rare-earth oxide based coatings
US9869012B2 · kind B2 · utility
8Cited by
34References
20Claims
0Family size
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Key dates
| Filing date | Jan 23, 2017 |
| Grant date | Jan 16, 2018 |
| Priority date | — |
| Expiry date | Jan 23, 2037 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/1393
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing an article comprises performing ion assisted deposition (IAD) to deposit a protective layer on at least one surface of the article, wherein the protective layer is a plasma resistant rare earth oxide film having a thickness of less than 300 μm and an average surface roughness of 10 micro-inches or less.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.