Ion assisted deposition top coat of rare-earth oxide
US9869013B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Apr 25, 2014 |
| Grant date | Jan 16, 2018 |
| Priority date | — |
| Expiry date | Apr 25, 2034 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY10T428/24992
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
A method of manufacturing an article comprises providing an article such as a chamber component for an etch reactor. A plasma spray deposition process is performed for deposit a first protective layer over at least one surface of the chamber component. The first protective layer is a plasma resistant ceramic having a thickness of greater than approximately 50 microns and a plurality of cracks and pores. An ion assisted deposition (IAD) process is then performed to deposit a second protective layer over the first protective layer. The second protective layer is a plasma resistant rare earth oxide having a thickness of less than 50 microns and a porosity of less than 1%. The second protective layer seals the plurality of cracks and pores of the first protective layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.