Patent · US Active

Apparatus for treating surfaces of wafer-shaped articles

US9887120B2 · kind B2 · utility

0Cited by
12References
14Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 3, 2015
Grant dateFeb 6, 2018
Priority date
Expiry dateFeb 18, 2036

Classification

  • Technology area (CPC Y)Emerging Cross-Sectional Technologies
  • CPC primaryY10T279/1926
  • WIPO fieldMachine tools
  • WIPO sectorMechanical engineering

Abstract

A rotary chuck for processing wafer-shaped articles comprises a chuck body having a series of gripping pins that are movable by sliding horizontally and in unison relative to the chuck body from a first position in which the gripping pins are relatively more retracted into the chuck body to a second position in which the gripping pins are relatively more extended from the chuck body and in which the gripping pins are positioned so as to support a wafer-shaped article of a predetermined diameter.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.