Substrate liquid processing apparatus, substrate liquid processing method and substrate processing apparatus
US9895711B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Jan 25, 2016 |
| Grant date | Feb 20, 2018 |
| Priority date | — |
| Expiry date | Jan 25, 2036 |
Classification
- Technology area (CPC B)Performing Operations; Transporting
- CPC primaryB08B2203/0229
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A substrate liquid processing apparatus including: a substrate rotary-holding unit configured to rotate a substrate while holding the substrate; and a processing liquid supply unit configured to supply a processing liquid to a bottom surface of the substrate held by the substrate rotary-holding unit. The substrate rotary-holding unit includes: a base plate disposed spaced apart from the substrate below the substrate; a cover member supported by the base plate and disposed outside an outer periphery of the substrate; and a discharge port formed between the base plate and the cover member and configured to discharge an air stream occurring below the substrate. The support portion of the base plate and the cover member protrudes outwards from a top surface of the base plate to be connected to the cover member.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.