Electrochemical deposition chamber
US9903039B2 · kind B2 · utility
0Cited by
9References
11Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Mar 18, 2014 |
| Grant date | Feb 27, 2018 |
| Priority date | — |
| Expiry date | Mar 5, 2036 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25F7/00
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
According to the invention an electrochemical deposition or polishing clamber including:
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.