John MacNeil
22Patents
7h-index
28Co-inventors
69Inventor score
Filing activity: Oct 29, 1999 → Jun 24, 2021
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US7205246B2 | Forming low k dielectric layers | Electricity | 502 | Expired |
| US6640840B1 | Delivery of liquid precursors to semiconductor processing reactors | Emerging Cross-Sectional Technologies | 33 | Expired |
| US6653247B2 | Dielectric layer for a semiconductor device and method of producing the same | Electricity | 33 | Expired |
| US6846757B2 | Dielectric layer for a semiconductor device and method of producing the same | Electricity | 26 | Expired |
| US6627535B2 | Methods and apparatus for forming a film on a substrate | Emerging Cross-Sectional Technologies | 18 | Expired |
| US7210958B1 | Electrical contact crimp ear serration | Electricity | 18 | Expired |
| US7198526B1 | Low-profile flag electrical terminal connector assembly | Electricity | 17 | Expired |
| US7140928B1 | Contact for an electrical connector | Electricity | 5 | Expired |
| US7351669B2 | Method of forming a substantially closed void | Electricity | 4 | Expired |
| US6256871A | Crimping apparatus for electrical connectors | Emerging Cross-Sectional Technologies | 1 | Expired |
| US7309662B1 | Method and apparatus for forming a film on a substrate | Electricity | 1 | Expired |
| US7279201B2 | Methods and apparatus for forming precursors | Chemistry; Metallurgy | 1 | Expired |
| US8403699B1 | Strain relief electrical cable connector | Electricity | 1 | Active |
| US11643744B2 | Apparatus for electrochemically processing semiconductor substrates | Electricity | 0 | Active |
| US7732307B2 | Method of forming amorphous TiN by thermal chemical vapor deposition (CVD) | Emerging Cross-Sectional Technologies | 0 | Expired |
| US10385471B2 | Electrochemical deposition chamber | Chemistry; Metallurgy | 0 | Active |
| US11236433B2 | Apparatus and method for processing a substrate | Chemistry; Metallurgy | 0 | Active |
| US9945043B2 | Electro chemical deposition apparatus | Chemistry; Metallurgy | 0 | Active |
| US9903039B2 | Electrochemical deposition chamber | Chemistry; Metallurgy | 0 | Active |
| US8968535B2 | Ion beam source | Electricity | 0 | Active |
| US11066754B2 | Apparatus for electrochemically processing semiconductor substrates | Electricity | 0 | Active |
| US8728337B2 | Positive displacement pumping chamber | Electricity | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.