Patent · US Active

Lighting system of a microlithographic projection exposure system and method for operating such a lighting system

US9910360B2 · kind B2 · utility

2Cited by

2References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Deguenther · Aalen, DE
Vladimir Davydenko · Bad Herrenalb, DE
Thomas Korb · Schwäbisch Gmünd, DE
Johannes Eisenmenger · Ulm, DE

Key dates

Filing date	Aug 15, 2016
Grant date	Mar 6, 2018
Priority date	—
Expiry date	Aug 15, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/70116
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed fashion and an array of optical elements which are digitally switchable between two switching positions. The array may be produced using MEMS technology.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.