Patent · US Active

Projection exposure apparatus including at least one mirror

US9910364B2 · kind B2 · utility

2Cited by

0References

15Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Boris Bittner · Roth, DE
Norbert Wabra · Werneck, DE
Sonja Schneider · Lehrberg, DE
Ricarda Schoemer · Zusmarshausen, DE
Stefan Rist · Aalen, DE

Key dates

Filing date	Oct 20, 2016
Grant date	Mar 6, 2018
Priority date	—
Expiry date	Oct 20, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG03F7/705
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A microlithographic projection exposure apparatus includes: a projection lens for imaging mask structures via an exposure radiation including at least one optical element and at least one manipulator; a read-in device for reading in application-specific structure information defining at least one property of an angular distribution of the exposure radiation upon entering the projection lens; and a travel establishing device for establishing a travel command defining a change to be made in an optical effect of the at least one optical element by manipulation of a property of the optical element via the at least one manipulator along a travel. The travel establishing device is configured to establish the travel command in an at least two-stage optimization.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.