Radiation source, metrology apparatus, lithographic system and device manufacturing method
US9913357B2 · kind B2 · utility
4Cited by
8References
26Claims
0Family size
Assignee
Inventor
Key dates
| Filing date | Nov 14, 2014 |
| Grant date | Mar 6, 2018 |
| Priority date | — |
| Expiry date | Nov 14, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH05G2/0084
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A radiation source apparatus comprising: a container comprising walls for defining a space for containing a gaseous medium in which plasma which emits plasma emitted radiation is generated following excitation of the gaseous medium by a driving radiation; and a thermal load applicator adapted to apply a thermal load to at least part of the walls of the container to reduce stresses in the walls.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.