Extreme ultraviolet (EUV) substrate inspection system with simplified optics and method of manufacturing thereof
US9915621B2 · kind B2 · utility
4Cited by
1References
12Claims
0Family size
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Key dates
| Filing date | Dec 18, 2014 |
| Grant date | Mar 13, 2018 |
| Priority date | — |
| Expiry date | Dec 18, 2034 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01N2201/061
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
An extreme ultraviolet (EUV) substrate inspection system and method of manufacturing thereof, includes: an EUV source directing EUV illumination through an aperture; a light detector detecting mask illumination with reduced off axis rays reflected off from a substrate; and a computing device processing image data detected by the light detector.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.