Patent · US Active

Method of forming a structure on a substrate

US9916980B1 · kind B1 · utility

456Cited by

724References

23Claims

0Family size

Assignee

ASM IP Holding B.V. · NL

Inventors

Werner Knaepen · Leuven, BE
Jan Willem Maes · Wilrijk, BE
Bert Jongbloed · Oud-Heverlee, BE
Krzysztof Kamil Kachel · Leuven, BE
Dieter Pierreux · Dilbeek, BE
David Kurt de Roest · Kessel-Lo, BE

Key dates

Filing date	Dec 15, 2016
Grant date	Mar 13, 2018
Priority date	—
Expiry date	Dec 15, 2036

Classification

Technology area (CPC C)Chemistry; Metallurgy
CPC primaryC23C16/45525
WIPO fieldSurface technology, coating
WIPO sectorChemistry

Abstract

A method of forming a layer on a substrate is provided by providing the substrate with a hardmask material. The hardmask material is infiltrated with infiltration material during N infiltration cycles by:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.