Vertical inline CVD system

US9922854B2 · kind B2 · utility

Assignee

• Applied Materials, Inc. · US

Inventors

• Shinichi Kurita · San Jose, US
• Jozef Kudela · معلمی نژاد, US
• Suhail Anwar · San Jose, US
• John M. White · Hayward, US
• Dong-Kil Yim · Pleasanton, US
• Hans Georg Wolf · Bühl, DE
• Dennis Zvalo · Santa Clara, US
• Makoto Inagawa · Palo Alto, US
• Ikuo Mori · Kawasaki, JP

Key dates

• Filing date: Apr 29, 2011
• Grant date: Mar 20, 2018
• Expiry date: May 14, 2032

Classification

• Technology area (CPC H): Electricity
• CPC primary: H01L21/67098
• WIPO field: Electrical machinery, apparatus, energy
• WIPO sector: Electrical engineering

Abstract

The present invention generally relates to a vertical CVD system having a processing chamber that is capable of processing multiple substrates. The multiple substrates are disposed on opposite sides of the processing source within the processing chamber, yet the processing environments are not isolated from each other. The processing source is a horizontally centered vertical plasma generator that permits multiple substrates to be processed simultaneously on either side of the plasma generator, yet independent of each other. The system is arranged as a twin system whereby two identical processing lines, each with their own processing chamber, are arranged adjacent to each other. Multiple robots are used to load and unload the substrates from the processing system. Each robot can access both processing lines within the system.