Patent · US Active

Projection exposure method and projection exposure apparatus

US9933710B2 · kind B2 · utility

0Cited by

6References

20Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Stephan Andre · Le Mousseau, FR
Daniel Golde · Oberkochen, DE
Toralf Gruner · Hennef (Sieg), DE
Johannes Ruoff · Aalen, DE

Key dates

Filing date	Mar 27, 2017
Grant date	Apr 3, 2018
Priority date	—
Expiry date	Mar 27, 2037

Classification

Technology area (CPC G)Physics
CPC primaryG02B17/0663
WIPO fieldOptics
WIPO sectorInstruments

Abstract

A projection exposure method for exposing a radiation-sensitive substrate with at least one image of a pattern of a mask in a projection exposure apparatus includes using an anamorphic projection lens

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.