Daniel Golde
5Patents
1h-index
13Co-inventors
40Inventor score
Filing activity: Feb 24, 2017 → Dec 16, 2022
Most-cited inventions
| Patent | Title | Area | Cited by | Status |
|---|---|---|---|---|
| US10048592B2 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Physics | 3 | Active |
| US12210289B2 | Mirror, in particular for a microlithographic projection exposure apparatus | Electricity | 0 | Active |
| US10591825B2 | Projection lens, projection exposure apparatus and projection exposure method for EUV microlithography | Physics | 0 | Active |
| US12222655B2 | Stop, optical system and lithography apparatus | Physics | 0 | Active |
| US9933710B2 | Projection exposure method and projection exposure apparatus | Physics | 0 | Active |
Source: USPTO / EPO open patent data. Inventor disambiguation is heuristic; counts are objective bibliographic measures.