Patent · US Active

Method for obtaining patterns in a layer

US9934973B2 · kind B2 · utility

0Cited by

2References

19Claims

0Family size

Assignee

COMMISSARIAT A L'ENERGIE ATOMIQUE ET AUX ENERGIES ALTERNATIVES · FR

Inventors

Stefan Landis · Tullins, FR
Nicolas Posseme · Grenoble, FR
Sebastien Barnola · Meylan, FR
Thibaut David · Goncelin, FR
Lamia Nouri · Le Bicêtre, FR

Key dates

Filing date	Dec 22, 2015
Grant date	Apr 3, 2018
Priority date	—
Expiry date	Dec 22, 2035

Classification

Technology area (CPC Y)Emerging Cross-Sectional Technologies
CPC primaryY02E10/50
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The invention relates in particular to a method for producing subsequent patterns in an underlying layer (120), the method comprising at least one step of producing prior patterns in a carbon imprintable layer (110) on top of the underlying layer (120), the production of the prior patterns involving nanoimprinting of the imprintable layer (110) and leave in place a continuous layer formed by the imprintable layer (110) and covering the underlying layer (120), characterized in that it comprises the following step:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.