Lithographic apparatus and device manufacturing method
US9939740B2 · kind B2 · utility
1Cited by
2References
21Claims
0Family size
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Key dates
| Filing date | Jan 20, 2015 |
| Grant date | Apr 10, 2018 |
| Priority date | — |
| Expiry date | Jan 20, 2035 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG03F7/70908
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A lithographic apparatus including a barrier system and a device manufacturing method using such a lithographic apparatus. The barrier system is used to maintain a protected volume of gas within a barrier. The protected volume may be maintained when different components of the lithographic apparatus move relative to each other. The barrier system may be used in different locations within the lithographic apparatus. The geometry of the barrier affects how efficiently the protected volume is maintained, especially at high speeds. The geometry reduces the amount of ambient gas entering the protected volume from outside the barrier.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.