Patent · US Active

Receptacle device, device and method for handling substrate stacks

US9941149B2 · kind B2 · utility

1Cited by

4References

5Claims

0Family size

Assignee

EV GROUP E. THALLNER GMBH · AT

Inventors

Erich Thallner · St. Florian, AT
Friedrich Paul Lindner · Ried im Innkreis, AT

Key dates

Filing date	Apr 25, 2017
Grant date	Apr 10, 2018
Priority date	—
Expiry date	Apr 25, 2037

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/68728
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

The invention relates to a retaining system for handling substrate stacks, including a retaining surface for retaining a first substrate, and one or more recesses provided relative to the retaining surface, for retaining first magnetic bodies for securing the first substrate relative to a second substrate that is aligned with the first substrate. Second magnetic bodies are applied on a holding side of the second substrate.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.