Pattern accuracy detecting apparatus and processing system
US9941177B2 · kind B2 · utility
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9References
13Claims
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Key dates
| Filing date | Aug 31, 2016 |
| Grant date | Apr 10, 2018 |
| Priority date | — |
| Expiry date | Aug 31, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG01B2210/56
- WIPO fieldMeasurement
- WIPO sectorInstruments
Abstract
A pattern accuracy detecting apparatus includes a stage for supporting a substrate, an optical warpage detecting unit that measures a shape of a substrate disposed on the stage, an optical pattern detection unit that detects a position of a pattern on the substrate, and a processing unit that corrects the detected pattern position based on the measured shape of the substrate.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.