Electro chemical deposition apparatus
US9945043B2 · kind B2 · utility
Assignee
Inventor
Key dates
| Filing date | Dec 8, 2011 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Jul 18, 2033 |
Classification
- Technology area (CPC C)Chemistry; Metallurgy
- CPC primaryC25D5/18
- WIPO fieldSurface technology, coating
- WIPO sectorChemistry
Abstract
This invention relates to apparatus for electrochemical deposition onto the surface of a substrate. The apparatus includes an anode electrode 13 a support 12 for supporting the substrate 11 with its one surface 21 exposed at a location, the support 12 and the anode electrode 13 being relatively movable to alter the gap between the anode 13 and the location to define a chamber 23 between them and an electrical power source 18 with an ohmic contact to the seed layer 20 for creating a potential difference across the gap. The apparatus further includes a seal 14 for sealing with the seed layer 20 to define the fluid chamber 23; and the fluid inlet 16 and a fluid outlet 17 to the chamber 13.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.