Range-based real-time scanning electron microscope non-visual binner
US9947596B2 · kind B2 · utility
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16Claims
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Key dates
| Filing date | Aug 3, 2016 |
| Grant date | Apr 17, 2018 |
| Priority date | — |
| Expiry date | Aug 3, 2036 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L22/20
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
A technique to identify non-visual defects, such as SEM non-visual defects (SNVs), includes generating an image of a layer of a wafer, evaluating at least one attribute of the image using a classifier, and identifying the non-visual defects on the layer of the wafer. A controller can be configured to identify the non-visual defects using the classifier. This controller can communicate with a defect review tool, such as a scanning electron microscope (SEM).
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.