Patent · US Active

Physical vapor deposition (PVD) target having low friction pads

US9960021B2 · kind B2 · utility

5Cited by

11References

13Claims

0Family size

Assignee

Applied Materials, Inc. · US

Inventors

Martin Lee Riker · Round Rock, US
Uday Pai · San Jose, US
William Fruchterman · Santa Clara, US
Keith A. Miller · Schererville, US
Muhammad M. Rasheed · San Jose, US
Thanh X. Nguyen · San Jose, US
Kirankumar Neelasandra SAVANDAIAH · Bengaluru, IN

Key dates

Filing date	Feb 18, 2014
Grant date	May 1, 2018
Priority date	—
Expiry date	Dec 18, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01J37/3435
WIPO fieldElectrical machinery, apparatus, energy
WIPO sectorElectrical engineering

Abstract

Embodiments of target assemblies for use in substrate processing chambers are provided herein. In some embodiments, a target assembly includes a plate comprising a first side including a central portion and a support portion; a target disposed on the central portion; a plurality of recesses formed in the support portion; and a plurality of pads partially disposed in the plurality of recesses.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.