Variable frequency microwave (VFM) processes and applications in semiconductor thin film fabrications
US9960035B2 · kind B2 · utility
1Cited by
7References
20Claims
0Family size
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Key dates
| Filing date | Jan 5, 2017 |
| Grant date | May 1, 2018 |
| Priority date | — |
| Expiry date | Jan 5, 2037 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67115
- WIPO fieldSemiconductors
- WIPO sectorElectrical engineering
Abstract
Methods and apparatus for processing a substrate are described herein. A vacuum multi-chamber deposition tool can include a degas chamber with both a heating mechanism and a variable frequency microwave source. The methods described herein use variable frequency microwave radiation to increased quality and speed of the degas process without damaging the various components.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.