Patent · US Active

Device and method for treating substrate surfaces

US9960058B2 · kind B2 · utility

0Cited by

4References

15Claims

0Family size

Assignee

EV GROUP E. THALLNER GMBH · AT

Inventors

Thomas Glinsner · Ried im Innkreis, AT
Ronald Holzleitner · Gmunden, AT
Thomas Wieser · Kirchdorf am Inn, DE
Florian Schmid · Ried im Innkreis, AT

Key dates

Filing date	Sep 22, 2011
Grant date	May 1, 2018
Priority date	—
Expiry date	Feb 12, 2034

Classification

Technology area (CPC H)Electricity
CPC primaryH01L21/68714
WIPO fieldSemiconductors
WIPO sectorElectrical engineering

Abstract

A device and method for treatment of a substrate treatment surface of a substrate with a fluid by immersion of the substrate treatment surface into the fluid. The device includes:

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.