Direct current pulsing plasma systems
US9966231B2 · kind B2 · utility
Assignee
Inventors
Key dates
| Filing date | Dec 2, 2016 |
| Grant date | May 8, 2018 |
| Priority date | — |
| Expiry date | Dec 2, 2036 |
Classification
- Technology area (CPC Y)Emerging Cross-Sectional Technologies
- CPC primaryY02B70/10
- WIPO fieldElectrical machinery, apparatus, energy
- WIPO sectorElectrical engineering
Abstract
A plasma processing system is provided that includes a chamber having a lower electrode coupled to a substrate support and an upper electrode coupled to ground. The plasma processing system having a plasma processing volume that is defined between the upper electrode and the lower electrode. A direct current (DC) to direct current (DC) converter is provided to receive at an input a DC voltage input and supply at an output an amplified DC voltage signal that includes a radio frequency (RF) component. The DC voltage input follows a pulsing pattern that is digitally programmable. The output of the DC to DC convertor is connected to the lower electrode of the chamber. A controller is interfaced with the DC to DC converter to set the pulsing pattern. In one example, the DC to DC converter uses one of a bipolar or non-bipolar DC voltage supply and a RF generator is driven by a DC voltage supply. The RF generator is configured to produce a frequency ripple that defines the RF component.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.