Substrate processing apparatus, method for manufacturing semiconductor device, and non-transitory computer-readable recording medium
US9966289B2 · kind B2 · utility
1Cited by
6References
10Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 19, 2014 |
| Grant date | May 8, 2018 |
| Priority date | — |
| Expiry date | Sep 19, 2034 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01L21/67769
- WIPO fieldHandling
- WIPO sectorMechanical engineering
Abstract
An apparatus and method capable of reducing the footprint of substrate processing system. An apparatus includes a housing chamber including a housing cabinet which houses housing containers for housing substrates, and a housing container carrying mechanism provided on the ceiling of the housing chamber and configured to carry the housing containers.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.