Patent · US Active

Lighting system of a microlithographic projection exposure system and method for operating such a lighting system

US9977334B2 · kind B2 · utility

0Cited by

7References

17Claims

0Family size

Assignee

Carl Zeiss SMT GmbH · DE

Inventors

Markus Deguenther · Aalen, DE
Vladimir Davydenko · Bad Herrenalb, DE
Thomas Korb · Schwäbisch Gmünd, DE
Johannes Eisenmenger · Ulm, DE

Key dates

Filing date	Aug 1, 2016
Grant date	May 22, 2018
Priority date	—
Expiry date	Aug 1, 2036

Classification

Technology area (CPC G)Physics
CPC primaryG02B26/0833
WIPO fieldOptics
WIPO sectorInstruments

Abstract

An illumination system of a microlithographic projection exposure apparatus includes a light source operated in a pulsed manner and a DMD (digital mirror device) or another array of optical elements, which are digitally switchable between two switching positions.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.