Lithographic apparatus and method

US9977348B2 · kind B2 · utility

Assignee

• ASML NETHERLANDS B.V. · NL

Inventors

• Günes NAKIBOGLU · Eindhoven, NL
• Suzanne Johanna Antonetta Geertruda Cosijns · Casteren, NL
• Anne Willemijn Bertine Quist · Eindhoven, NL
• Lukasz Sosniak · 's-Hertogenbosch, NL
• Frank Johannes Jacobus Van Boxtel · Eindhoven, NL
• Engelbertus Antonius Fransiscus Van Der Pasch · Oirschot, NL

Key dates

• Filing date: Jun 25, 2015
• Grant date: May 22, 2018
• Expiry date: Jun 25, 2035

Classification

• Technology area (CPC G): Physics
• CPC primary: G03F7/709
• WIPO field: Optics
• WIPO sector: Instruments

Abstract

A lithographic apparatus includes an optical sensor, a movable body, a support, a deflector system, a first drive system and a second drive system. The movable body is moveable relative to the sensor. The support is for holding the sensor. The first drive system is arranged to move the movable body relative to the sensor. The second drive system is arranged to move the first drive system relative to the sensor. The second drive system is arranged to move the deflector system relative to the sensor. A disturbance is induced by a movement of the movable body. The deflector system is arranged to create a deflecting area for reflecting the disturbance away from the support.