Method and apparatus for generating radiation
US9986628B2 · kind B2 · utility
1Cited by
16References
15Claims
0Family size
Assignee
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Key dates
| Filing date | Oct 10, 2013 |
| Grant date | May 29, 2018 |
| Priority date | — |
| Expiry date | Oct 10, 2033 |
Classification
- Technology area (CPC H)Electricity
- CPC primaryH01S3/2383
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target (50) at a plasma formation location (12) and directing a continuous-wave excitation beam (6) at the plasma formation location such that fuel within the continuously renewing fuel target is excited by the continuous-wave excitation beam to a radiation generating plasma.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.