Pellicle for reticle and multilayer mirror
US9989844B2 · kind B2 · utility
5Cited by
15References
13Claims
0Family size
Assignee
Inventors
Key dates
| Filing date | Sep 29, 2016 |
| Grant date | Jun 5, 2018 |
| Priority date | — |
| Expiry date | Sep 29, 2036 |
Classification
- Technology area (CPC G)Physics
- CPC primaryG21K2201/061
- WIPO fieldOptics
- WIPO sectorInstruments
Abstract
A pellicle that includes graphene is constructed and arranged for an EUV reticle. A multilayer mirror includes graphene as an outermost layer.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.