Gas diffusion plate for electrode of semiconductor wafer processing apparatus
USD411516S · kind S · design
444Cited by
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1Claims
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Key dates
| Filing date | Sep 10, 1996 |
| Grant date | Jun 29, 1999 |
| Priority date | — |
| Expiry date | Jun 29, 2013 |
Classification
- Technology area (CPC —)General
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.