Patent · US Active

Elastic membrane for semiconductor wafer polishing apparatus

USD808349S1 · kind S1 · design

17Cited by
20References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 17, 2016
Grant dateJan 23, 2018
Priority date
Expiry dateJan 23, 2033

Classification

  • Technology area (CPC —)General

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.