Patent · US Active

Liquid discharge nozzle for semiconductor substrate processing apparatus

USD929534S1 · kind S1 · design

1Cited by
8References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateOct 23, 2019
Grant dateAug 31, 2021
Priority date
Expiry dateAug 31, 2036

Classification

  • Technology area (CPC —)General

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.