Patent · US Active

Liquid discharge nozzle for semiconductor substrate processing apparatus

USD930796S1 · kind S1 · design

0Cited by
8References
1Claims
0Family size

Assignee

Inventors

Key dates

Filing dateAug 3, 2020
Grant dateSep 14, 2021
Priority date
Expiry dateSep 14, 2036

Classification

  • Technology area (CPC —)General

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.