Negative type resist composition

USRE40964E1 · kind E1 · reissue

Assignee

• SUMITOMO CHEMICAL COMPANY, LIMITED · JP

Inventors

• Masumi Suetsugu · Darreh Shahr, IR
• Takehiro Kusumoto · Osaka, JP
• Naoki Takeyama · Settsu, JP
• Masanori Shinada · Osaka, JP

Key dates

• Filing date: Sep 17, 2003
• Grant date: Nov 10, 2009
• Expiry date: Sep 17, 2023

Classification

• Technology area (CPC —): General

Abstract

A negative type resist composition is provided, which provides excellent resolution, satisfactory profile and outstanding process stability; is suitable for exposure using deep ultra violet ray; and comprises alkali soluble resin, acid generator, crosslinking agent, and a basic compound represented by the following formula (I) wherein, A represents sulfide group, disulfide group or bivalent aliphatic hydrocarbon residue which may be optionally interrupted by imino group, sulfide group, or disulfide group, X represents nitrogen atom or C(NH2), and R1 and R2 independently represent hydrogen or alkyl.