Patent · US Active

Radiation source, lithographic apparatus, device manufacturing method, and device manufactured thereby

USRE41362E1 · kind E1 · reissue

2Cited by
5References
67Claims
0Family size

Assignee

Inventors

Key dates

Filing dateNov 16, 2006
Grant dateJun 1, 2010
Priority date
Expiry dateNov 16, 2026

Classification

  • Technology area (CPC —)General

Abstract

A radiation source includes an anode and a cathode for creating a discharge in a vapor in a space between anode and cathode and to form a plasma of a working vapor so as to generate electromagnetic radiation. The cathode defines a hollow cavity in communication with the discharge region through an aperture that has a substantially annular configuration around a central axis of said radiation source so as to initiate said discharge. A driver vapor is supplied to the cathode cavity and the working vapor is supplied in a region around the central axis in between anode and cathode.

Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.