Lithographic apparatus and device manufacturing method
USRE42849E1 · kind E1 · reissue
6Cited by
49References
45Claims
0Family size
Assignee
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Key dates
| Filing date | May 22, 2008 |
| Grant date | Oct 18, 2011 |
| Priority date | — |
| Expiry date | May 22, 2028 |
Classification
- Technology area (CPC —)General
Abstract
An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.
Source: USPTO / EPO open patent data. Objective bibliographic and citation counts.